| Electron supply |
Electrons arrive from semiconductor/contact regions, not through the gate dielectric in the ideal field-effect picture |
Particle paths and dielectric label |
| Depletion and inversion |
In the p-type MOSFET reference, holes recede near the surface and an electron inversion layer develops above threshold |
Carrier distribution and timing |
| Current direction |
For the illustrated n-channel bias, electrons move S → D and conventional current points D → S |
Arrows, labels and particles |
| Two electrical roles |
The gate controls carrier distribution; source–drain bias drives lateral transport |
Keep vertical and horizontal cues distinct |
| EDL charge signs |
Anions near the positive gate; cations on the electrolyte side near the semiconductor; electrons across that interface |
Legend, signs and locations |
| Both interfaces |
Gate–electrolyte and semiconductor–electrolyte charge layers contribute; the bulk is approximately neutral |
Macro distribution and potential profile |
| Effective distance |
The EDL separation is not the full electrolyte thickness |
Brackets, scale cues and text |
| Comparison quantity |
Both drawings reach the same target charge change, not equal measured current or all equal properties |
Shared charge parameter and voltage indicators |
| Capacitance relation |
ΔQ ≈ C_eff ΔV_eff is a qualified capacitive relation |
Do not treat it as a full nonlinear device solution |
| Numerical examples |
The 100-fold example and bar heights are schematic, not measured or scale-faithful |
Keep illustrative labels |
| Breakdown image |
Defects and a connected path illustrate one gate-related failure idea |
Do not add predicted lifetime, probability or threshold |
| Local field |
Low external voltage does not imply weak local EDL field |
Retain the limitation |
| Material strength |
EDL formation does not inherently raise intrinsic breakdown strength |
Avoid stronger-material or failure-proof wording |
| Electrochemistry |
Finite stability regime; redox, leakage and ion insertion are separate concerns |
Retain stability-window qualification |
| Lateral failure |
Efficient gating does not eliminate source–drain high-field or heating problems |
Preserve scope of the conclusion |
| Geometry |
Particles, cutaways, grid and dimensions serve explanation |
Do not call them measurements or solved ion dynamics |